I was recently at an offsite where CAD engineers, Designers, and Custom Designer developers were all present. We were reviewing capabilities and deployments of Custom Designer in our IP business. One of the CAD engineers was reviewing some capabilities they had implemented using Hercules manipulation of GDS that allowed analog designers to better “see” their designs and optimize the layout.
Posts by Bob Lefferts:
For those of you who made it to the recent San Jose SNUG meeting, you may have noticed a presentation titled, “Using Custom Designer to ‘Blow Up’ a Design”. I can assure you there were no pyrotechnics involved – the ‘Blow Up” really meant ‘Scale Up” since the paper detailed how we were able to use the power of Custom Designer to reverse the sands of time. Our normal IP flow is a forward migration from an existing process node down the scaling curve to a more advanced – smaller – node. In this case, several customers requested a 130nm implementation of a piece of our production proven IP that had just been released on 65nm. Our customer made this request for a variety of reasons but one key reason was tied to the higher cost of 65nm mask production. Moving the design to 130nm would save them a ton of money even if it seems to be moving backwards.